Charge storage nodes with conductive nanodots

ABSTRACT

Memory cells formed to include a charge storage node having conductive nanodots over a charge storage material are useful in non-volatile memory devices and electronic systems.

TECHNICAL FIELD OF THE INVENTION

The present disclosure relates generally to semiconductor memories and,in particular, in one or more embodiments, the present disclosurerelates to memory cells for non-volatile memory devices, the memorycells having charge storage nodes.

BACKGROUND OF THE INVENTION

Memory devices are typically provided as internal, semiconductor,integrated circuits in computers or other electronic devices. There aremany different types of memory including random-access memory (RAM),read only memory (ROM), dynamic random access memory (DRAM), synchronousdynamic random access memory (SDRAM), and flash memory.

Flash memory devices have developed into a popular source ofnon-volatile memory for a wide range of electronic applications. Flashmemory devices typically use a one-transistor memory cell that allowsfor high memory densities, high reliability, and low power consumption.Changes in threshold voltage of the cells, through programming (which issometimes referred to as writing) of charge storage nodes (e.g.,floating gates or charge traps) or other physical phenomena (e.g., phasechange or polarization), determine the data value of each cell. Commonuses for flash memory include personal computers, personal digitalassistants (PDAs), digital cameras, digital media players, cellulartelephones, and removable memory modules.

A NAND flash memory device is a common type of flash memory device, socalled for the logical form in which the basic memory cell configurationis arranged. Typically, the array of memory cells for NAND flash memorydevices is arranged such that the control gate of each memory cell of arow of the array is connected together to form an access line, such as aword line. Columns of the array include strings (often termed NANDstrings) of memory cells connected together in series, source to drain,between a pair of select lines, a source select line and a drain selectline. A “column” refers to a group of memory cells that are commonlycoupled to a local data line, such as a local bit line. It does notrequire any particular orientation or linear relationship, but insteadrefers to the logical relationship between memory cell and data line.The source select line includes a source select gate at eachintersection between a NAND string and the source select line, and thedrain select line includes a drain select gate at each intersectionbetween a NAND string and the drain select line. Each source select gateis connected to a source line, while each drain select gate is connectedto a data line, such as column bit line.

As memory densities increase, issues with data retention, programsaturation and trap-up tend to worsen. For example, while polysiliconcharge storage nodes have been commonly used for years, they tend tobecome impracticable as their thickness becomes too thin, e.g., around50 Å (5 nm). For the reasons stated above, and for other reasons statedbelow which will become apparent to those skilled in the art uponreading and understanding the present specification, there is a need inthe art for alternative memory device architectures.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a simplified block diagram of a memory device coupled to aprocessor as part of an electronic system, according to an embodiment ofthe disclosure.

FIG. 2 is a schematic of a portion of an example NAND memory array asmight be found in the memory device of FIG. 1.

FIGS. 3A-3E depict a portion of a memory array during various stages offabrication in accordance with an embodiment of the disclosure.

FIGS. 4A-4D depict a portion of a memory cell gate stack during variousstages of fabrication of a charge storage node in accordance with anembodiment of the disclosure.

DETAILED DESCRIPTION OF THE INVENTION

In the following detailed description, reference is made to theaccompanying drawings that form a part hereof, and in which is shown, byway of illustration, specific embodiments. In the drawings, likenumerals describe substantially similar components throughout theseveral views. Other embodiments may be utilized and structural,logical, and electrical changes may be made without departing from thescope of the present disclosure. The term semiconductor can refer to,for example, a layer of material, a wafer, or a substrate, and includesany base semiconductor structure. “Semiconductor” is to be understood asincluding silicon on sapphire (SOS) technology, silicon on insulator(SOI) technology, thin film transistor (TFT) technology, doped andundoped semiconductors, epitaxial layers of a silicon supported by abase semiconductor structure, as well as other semiconductor structureswell known to one skilled in the art. Furthermore, when reference ismade to a semiconductor in the following description, previous processsteps may have been utilized to form regions/junctions in the basesemiconductor structure. The following detailed description is,therefore, not to be taken in a limiting sense.

Various embodiments include memory cells having a charge storage nodebetween a first dielectric, e.g., a tunnel dielectric, and a seconddielectric, e.g., an intergate dielectric, and memory devices andsystems including such memory cells. Memory cells of this type are oftenreferred to as floating-gate memory cells or charge trap memory cells.Charge storage nodes of various embodiments include a charge storagematerial and conductive nanodots capable of storing a charge.

FIG. 1 is a simplified block diagram of a memory device 100, as oneexample of an integrated circuit device, in communication with (e.g.,coupled to) a processor 130 as part of an electronic system, accordingto an embodiment of the disclosure. Some examples of electronic systemsinclude personal computers, personal digital assistants (PDAs), digitalcameras, digital media players, digital recorders, games, appliances,vehicles, wireless devices, cellular telephones and the like. Theprocessor 130 may be, for example, a memory controller or other externalprocessor for use in the control and access of the memory device 100.

Memory device 100 includes an array of memory cells 104 logicallyarranged in rows and columns. At least one memory cell of the array ofmemory cells 104 includes a charge storage node in accordance with anembodiment of the disclosure. Although various embodiments will bedescribed primarily with reference to NAND memory arrays, the variousembodiments are not limited to a specific architecture of the memoryarray 104. Some examples of other array architectures suitable for thepresent embodiments include NOR arrays, AND arrays or other arrays.

A row decode circuitry 108 and a column decode circuitry 110 areprovided to decode address signals. Row decode circuitry 108 containsone or more transistors in accordance with embodiments of thedisclosure. Address signals are received and decoded to access memoryarray 104. Memory device 100 also includes input/output (I/O) controlcircuitry 112 to manage input of commands, addresses and data to thememory device 100 as well as output of data and status information fromthe memory device 100. An address register 114 is coupled between I/Ocontrol circuitry 112 and row decode circuitry 108 and column decodecircuitry 110 to latch the address signals prior to decoding. A commandregister 124 is coupled between I/O control circuitry 112 and controllogic 116 to latch incoming commands. Control logic 116 controls accessto the memory array 104 in response to the commands and generates statusinformation for the external processor 130. The control logic 116 iscoupled to row decode circuitry 108 and column decode circuitry 110 tocontrol the row decode circuitry 108 and column decode circuitry 110 inresponse to the addresses.

Control logic 116 is also coupled to a cache register 118. Cacheregister 118 latches data, either incoming or outgoing, as directed bycontrol logic 116 to temporarily store data while the memory array 104is busy writing or reading, respectively, other data. During a writeoperation, data is passed from the cache register 118 to data register120 for transfer to the memory array 104; then new data is latched inthe cache register 118 from the I/O control circuitry 112. During a readoperation, data is passed from the cache register 118 to the I/O controlcircuitry 112 for output to the external processor 130; then new data ispassed from the data register 120 to the cache register 118. A statusregister 122 is coupled between I/O control circuitry 112 and controllogic 116 to latch the status information for output to the processor130.

Memory device 100 receives control signals at control logic 116 fromprocessor 130 over a control link 132. The control signals may include achip enable CE#, a command latch enable CLE, an address latch enableALE, and a write enable WE#. Memory device 100 receives command signals(which represent commands), address signals (which represent addresses),and data signals (which represent data) from processor 130 over amultiplexed input/output (I/O) bus 134 and outputs data to processor 130over I/O bus 134.

Specifically, the commands are received over input/output (I/O) pins[7:0] of I/O bus 134 at I/O control circuitry 112 and are written intocommand register 124. The addresses are received over input/output (I/O)pins [7:0] of bus 134 at I/O control circuitry 112 and are written intoaddress register 114. The data are received over input/output (I/O) pins[7:0] for an 8-bit device or input/output (I/O) pins [15:0] for a 16-bitdevice at I/O control circuitry 112 and are written into cache register118. The data are subsequently written into data register 120 forprogramming memory array 104. For another embodiment, cache register 118may be omitted, and the data are written directly into data register120. Data are also output over input/output (I/O) pins [7:0] for an8-bit device or input/output (I/O) pins [15:0] for a 16-bit device.

It will be appreciated by those skilled in the art that additionalcircuitry and signals can be provided, and that the memory device ofFIG. 1 has been simplified. It should be recognized that thefunctionality of the various block components described with referenceto FIG. 1 may not necessarily be segregated to distinct components orcomponent portions of an integrated circuit device. For example, asingle component or component portion of an integrated circuit devicecould be adapted to perform the functionality of more than one blockcomponent of FIG. 1. Alternatively, one or more components or componentportions of an integrated circuit device could be combined to performthe functionality of a single block component of FIG. 1.

Additionally, while specific I/O pins are described in accordance withpopular conventions for receipt and output of the various signals, it isnoted that other combinations or numbers of I/O pins may be used in thevarious embodiments.

FIG. 2 is a schematic of a NAND memory array 200, e.g., as a portion ofmemory array 104. Memory array 200 may be formed in a commonconductively doped region (e.g., a common p-well) formed in asemiconductor.

As shown in FIG. 2, the memory array 200 includes access lines, commonlyreferred to as word lines (which may comprise commonly coupled controlgates 202 ₁ to 202 _(N)) and intersecting data lines, such as bit lines204 ₁ to 204 _(M). For ease of addressing in the digital environment,the number of word lines 202 and the number of bit lines 204 aregenerally each some power of two.

Memory array 200 includes NAND strings 206 ₁ to 206 _(M). Each NANDstring includes transistors 208 ₁ to 208 _(N), each located at anintersection of a word line 202 and a bit line 204. The transistors 208,depicted as floating-gate transistors in FIG. 2, represent non-volatilememory cells for storage of data. At least one transistor 208 has a gatestack having a charge storage node in accordance with an embodiment ofthe disclosure. The floating-gate transistors 208 of each NAND string206 are connected in series source to drain between one or more sourceselect gates 210, e.g., a field-effect transistor (FET), and one or moredrain select gates 212, e.g., an FET. Each source select gate 210 islocated at an intersection of a local bit line 204 and a source selectline 214, while each drain select gate 212 is located at an intersectionof a local bit line 204 and a drain select line 215.

A source of each source select gate 210 is connected to a common sourceline 216. The drain of each source select gate 210 is connected to thesource of the first floating-gate transistor 208 of the correspondingNAND string 206. For example, the drain of source select gate 210 ₁ isconnected to the source of floating-gate transistor 208 ₁ of thecorresponding NAND string 206 ₁. A control gate of each source selectgate 210 is connected to source select line 214. If multiple sourceselect gates 210 are utilized for a given NAND string 206, they would becoupled in series between the common source line 216 and the firstfloating-gate transistor 208 of that NAND string 206.

The drain of each drain select gate 212 is connected to a local bit line204 for the corresponding NAND string at a drain contact. For example,the drain of drain select gate 212 ₁ is connected to the local bit line204 ₁ for the corresponding NAND string 206 ₁ at a drain contact. Thesource of each drain select gate 212 is connected to the drain of thelast floating-gate transistor 208 of the corresponding NAND string 206.For example, the source of drain select gate 212 ₁ is connected to thedrain of floating-gate transistor 208 _(N) of the corresponding NANDstring 206 ₁. If multiple drain select gates 212 are utilized for agiven NAND string 206, they would be coupled in series between thecorresponding bit line 204 and the last floating-gate transistor 208_(N) of that NAND string 206.

Typical construction of floating-gate transistors 208 includes a source230 and a drain 232, a floating gate 234 as a charge storage node, and acontrol gate 236, as shown in FIG. 2. Floating-gate transistors 208 havetheir control gates 236 coupled to a word line 202 (e.g., the controlgates may be commonly coupled to form a word line). A column of thefloating-gate transistors 208 are those NAND strings 206 coupled to agiven local bit line 204. A row of the floating-gate transistors 208 arethose transistors commonly coupled to a given word line 202.

FIGS. 3A-3E depict a portion of a memory array during various stages offabrication. FIG. 3A depicts a portion of a memory array after severalprocessing steps have occurred. In general, FIG. 3A may depict asemiconductor 305 upon which portions of future gate stacks ofnon-volatile memory cells are formed. For one embodiment, thesemiconductor 305 is a monocrystalline silicon. For a furtherembodiment, semiconductor 305 is a conductively-doped monocrystallinesilicon. Other embodiments may include amorphous silicon,polycrystalline silicon (commonly referred to as polysilicon), or othersemiconductor materials. Semiconductor 305 may be conductively doped toa first conductivity type, e.g., a p-type conductivity.

As further depicted in FIG. 3A, a tunnel dielectric 310, a chargestorage node 315 having conductive nanodots in accordance with anembodiment of the disclosure, an intergate dielectric 320, a controlgate 325 and a dielectric cap 330 have been formed on the semiconductor305. These elements will form the gate stacks of future memory cells.

Formation of the structure of FIG. 3A can include formation of thetunnel dielectric 310 over an active region of the semiconductor 305,e.g., an area over which memory cells will be formed. For example, theactive region of the semiconductor 305 may include a conductively-dopedwell of a semiconductor wafer. The tunnel dielectric 310 is generallyone or more dielectric materials. The tunnel dielectric 310 might beformed, for example, by thermal oxidation of the semiconductor 305.Alternatively, the tunnel dielectric 310 could be formed by a blanketdeposition of a dielectric material, such as by chemical vapordeposition (CVD), physical vapor deposition (PVD) or atomic layerdeposition (ALD). Example dielectric materials for tunnel dielectric 310include silicon oxides (SiO_(x)), silicon nitride (SiN_(x)), siliconoxynitrides (SiO_(x)N_(y)), aluminum oxides (AlO_(x)), hafnium oxides(HfO_(x)), hafnium aluminum oxides (HfAlO_(x)), lanthanum oxides(LaO_(x)), tantalum oxides (TaO_(x)), zirconium oxides (ZrO_(x)),zirconium aluminum oxides (ZrAlO_(x)), etc., and combinations thereof.

The charge storage node 315 is then formed over the tunnel dielectric310. Formation of the charge storage node 315 will be described in moredetail with reference to FIGS. 4A-4D. The charge storage node 315 willstore a charge indicative of a data state of the future memory cells.

The intergate dielectric 320 is then formed over the charge storage node315. The intergate dielectric 320 is generally one or more dielectricmaterials. For example, the intergate dielectric 320 may include one ormore layers of dielectric materials including high-K dielectricmaterials. Example high-K dielectric materials for intergate dielectric320 include aluminum oxides (AlO_(x)), hafnium oxides (HfO_(x)), hafniumaluminum oxides (HfAlO_(x)), hafnium silicon oxides (HfSiO_(x)),lanthanum oxides (LaO_(x)), tantalum oxides (TaO_(x)), zirconium oxides(ZrO_(x)), zirconium aluminum oxides (ZrAlO_(x)), yttrium oxide (Y₂O₃),etc. For one embodiment, the intergate dielectric 320 includes anozone-based formation of hafnium silicon oxide followed by water-basedformation of hafnium oxide.

The control gate 325 is formed over the intergate dielectric 320. Ingeneral, the control gate 325 includes one or more conductive materials.For one embodiment, the control gate 325 contains a conductively-dopedpolysilicon. For another embodiment, the control gate 325 contains ametal-containing material. For a further embodiment, the control gate325 includes a metal-containing material over polysilicon, e.g., arefractory metal silicide formed on a conductively-doped polysilicon.The metals of chromium (Cr), cobalt (Co), hafnium (Hf), molybdenum (Mo),niobium (Nb), tantalum (Ta), titanium (Ti), tungsten (W), vanadium (V),zirconium (Zr), and metal nitrides (including, for example, titaniumnitride, tantalum nitride, tantalum carbon nitride, tungsten nitride)for metal gates are generally recognized as refractory metal materials.For another embodiment, the control gate 325 contains multiplemetal-containing materials, e.g., a titanium nitride (TiN) barrier overthe intergate dielectric 320, titanium (Ti) as an adhesion material overthe barrier, and tungsten (W) over the adhesion material.

The dielectric cap 330 can be formed over the control-gate 230 to act asan insulator and barrier layer to protect the control gate 230 duringsubsequent processing. The dielectric cap 330 contains one or moredielectric materials and may include, for example, such dielectrics assilicon oxides (SiO_(x)), silicon nitride (SiN_(x)), and siliconoxynitrides (SiO_(x)N_(y)). For one embodiment, the dielectric cap 330is a silicon nitride, formed, for example, by such methods as CVD. It isnoted that additional layers may be used to form the gate stack, such asbarrier materials to inhibit diffusion between opposing materials oradhesion materials to promote adhesion between opposing materials.

In FIG. 3B, a mask 335 is formed and patterned over the dielectric cap330. As one example, a photolithographic resist material could bedeposited as mask layer 335 overlying the dielectric cap 330, exposed toa radiation source, such as UV light, and developed to define areasoverlying the dielectric cap 330 for removal.

Following this patterning of the mask 335, exposed portions of thedielectric cap 330 and underlying portions are removed in FIG. 3C, suchas by etching or other removal process, to expose the semiconductor 305.More than one removal process may be used where the chosen removalprocess is ineffective at removing an underlying material. Followingremoval, one or more gate stacks 337 for word lines are defined.Although FIGS. 3A-3E depict only memory cells, the select gates (notshown in FIGS. 3A-3E) may be formed of the same gate stacks 337, withthe exception that the control gate 325 and charge storage node 315would typically be shorted together to act as a single conductiveentity.

In FIG. 3D, source/drain regions 340 are formed generally adjacent thetunnel dielectric 310, such as by conductive doping of portions of thesemiconductor 305 exposed in FIG. 3C. A channel region of a memory cellis defined by the area of the semiconductor 305 between the source/drainregions 340. Source/drain regions 340 will generally have a conductivitytype different than the conductivity type of the semiconductor 305. Theconductivity types may be opposites. For example, for a p-typesemiconductor 305, the source/drain regions 215 might have an n+-typeconductivity.

In FIG. 3E, dielectric spacers 345 may also be formed. As one example, ablanket deposit of some dielectric material, e.g., silicon nitride, isformed overlying the gate stacks 302, followed by an anisotropic removalof the blanket deposit to form the dielectric spacers 345. The resultingstructure depicted in FIG. 3E includes series-coupled memory cells, suchas those of a NAND string. However, it will be readily apparent thatmemory cells may be formed for an alternate array architecture using thegate stacks 337.

FIGS. 4A-4D depict a portion of a memory array during various stages offabrication of a charge storage node in accordance with an embodiment ofthe disclosure. In FIG. 4A, a charge storage material 450 is formed overthe tunnel dielectric 310 overlying the semiconductor 305. The chargestorage material 450 is generally one or more materials capable ofstoring a charge. For one embodiment, the charge storage material 450 isa silicon-containing material. Examples include polysilicon, amorphoussilicon and monocrystalline silicon. The charge storage material 450 maybe an undoped or conductively doped material. For example, the chargestorage material 450 might be a polysilicon material having a p-typeconductivity. Conductively doping semiconductor materials, such asmonocrystalline silicon, amorphous silicon and polysilicon, may beperformed subsequent to formation or concurrent with formation.

For one embodiment, the charge storage material 450 has a thickness ofapproximately 10 Å to 100 Å (1 nm to 10 nm). For a further embodiment,the charge storage material 450 has a thickness of approximately 30 Å to50 Å (3 nm to 5 nm). It is recognized that the variability of industrialfabrication will inherently produce minor variations in thickness suchthat a process seeking a particular thickness, e.g., 30 Å (3 nm), willlikely produce thicknesses cell-to-cell that are above and below thatparticular value.

As depicted in FIG. 4B, an oxide 455 may be formed on the charge storagematerial 450. For example, where charge storage material 450 is asilicon-containing material, the oxide 455 might represent a nativeoxide formed on a surface of the silicon-containing material.Alternatively, the oxide 455 might represent an oxide formed on thesilicon-containing material by such methods as thermal oxidation, CVD orPVD. For one embodiment, the oxide 455 has a thickness of approximately5 Å to 10 Å (0.5 nm to 1 nm).

In FIG. 4C, the oxide 455, or alternatively, the surface of the chargestorage material 450 if no oxide 455 is formed, may be nitridized. Thenitridation is represented by arrows 465. The nitridation seeks toprovide a barrier 460 between the charge storage material 450 and thesubsequent formation of nanodots. For example, where charge storagematerial 450 is a silicon-containing material, the nitridation may forma barrier 460 of silicon oxynitride if an oxide 455 is formed, or form abarrier 460 of silicon nitride if no oxide 455 is formed. Suchnitridation can serve to mitigate interaction of the future nanodotswith either the barrier 460 or the charge storage material 450, e.g., toinhibit over silicidation of a silicon-containing barrier 460 or chargestorage material 450. For one embodiment, the barrier 460 has athickness of approximately 5 Å to 10 Å (0.5 nm to 1 nm). Some exampleprocesses for carrying out a nitridation include direct plasmanitridation and ammonia anneal.

For an alternate embodiment, a nitridized barrier 460 may be formed onthe charge storage material 450 directly, such as a nitride oroxynitride formed on the charge storage material 450 by CVD, PVD oratomic layer deposition (ALD) without performing a nitridation of anoxide 455 or charge storage material 450. For example, a silicon-richALD silicon nitride may be formed as the barrier 460 on the chargestorage material 450. Furthermore, the oxide 455 may serve directly asthe barrier 460 without nitridation where the properties of the oxide455 provide mitigation of interaction between the future nanodots andthe charge storage material 450. Regardless of its form, e.g., an oxide,nitride, oxynitride or other material, the barrier 460 is generally somematerial chosen to provide mitigation of interaction between the chargestorage material 450 and future nanodots. As such, the barrier 460 maybe eliminated where interaction between the future nanodots and thecharge storage material 450 is not a concern, for example if the twomaterials are non-reactive. For some embodiments, barrier 460 is adielectric material

In FIG. 4D, nanodots 470 are formed on the barrier 460. The nanodots 470generally contain one or more conductive materials. For variousembodiments, the nanodots 470 contain metal. For example, the nanodots470 may represent elemental metals, e.g., titanium, tantalum, tungsten,ruthenium, rhodium, platinum, etc., or metal alloys thereof.Alternatively, the nanodots 470 may represent metal nitrides, e.g.,titanium nitride, tantalum nitride, tungsten nitride, ruthenium nitride,rhodium nitride, platinum nitride, etc., metal silicides, e.g., titaniumsilicide, tantalum silicide, tungsten silicide, ruthenium silicide,rhodium silicide, platinum silicide, etc., or combinations of any of theforegoing. For example, titanium nanodots might be formed over asilicon-containing barrier, such as silicon oxynitride, and subsequentprocessing may form at least some titanium silicide through reactionbetween the titanium nanodots and silicon of the silicon-containingbarrier or of an underlying silicon-containing charge storage material,such that the nanodots would contain at least elemental titanium andtitanium silicide.

Nanodots 470 may be formed, for example, by CVD, ALD, PVD, etc. Thenanodots 470 generally represent discrete formations of conductivematerial, e.g., metal-containing material, such that while someindividual nanodots 470 may be adjoining one another, there will beportions of the barrier 460 (or charge storage material 450 wherebarrier 460 is eliminated) that will remain exposed between the nanodots470, and the nanodots 470 will not form a contiguous conductive entity.Accordingly, if an integrate dielectric, such as dielectric 320, isformed over the nanodots 470, it may form on such exposed portions ofthe barrier 460 and/or charge storage material 450. For one embodiment,a density of the nanodots 470 is approximately 1E12/cm² to 1E15/cm². Fora further embodiment, the density of the nanodots 470 is approximately1E13/cm². For one embodiment, the nanodots 470 have a thickness ofapproximately 20 Å+/−10 Å (2 nm+/−1 nm). Charge storage material 450,barrier 460 (if utilized) and nanodots 470 collectively define a chargestorage node 315. Formation of a memory cell using the charge storagenode 315 of FIG. 4D can proceed as described with reference to FIGS.3A-3E.

CONCLUSION

Non-volatile memory devices have been described utilizing memory cellsincluding a charge storage node having conductive nanodots over a chargestorage material. This differs from prior memory cell structures havingnanodots embedded within a charge storage material and provides a moredistinct interface than forming the nanodots directly on a tunneldielectric.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat any arrangement that is calculated to achieve the same purpose maybe substituted for the specific embodiments shown. Many adaptations ofthe embodiments will be apparent to those of ordinary skill in the art.Accordingly, this application is intended to cover any adaptations orvariations of the embodiments. It is manifestly intended that theembodiments be limited only by the following claims and equivalentsthereof.

What is claimed is:
 1. A memory cell, comprising: a first dielectricover a semiconductor; a charge storage node over the first dielectric; asecond dielectric over the charge storage node; a control gate over thesecond dielectric; and source/drain regions in the semiconductorgenerally adjacent the first dielectric; wherein the charge storage nodecomprises a charge storage material and conductive nanodots; and whereinthe conductive nanodots are between the charge storage material and thesecond dielectric.
 2. The memory cell of claim 1, further comprising abarrier between the conductive nanodots and the charge storage material.3. The memory cell of claim 1, wherein the conductive nanodots have adensity of 1E12/cm² to 1E15/cm².
 4. The memory cell of claim 1, whereinthe conductive nanodots comprise metal-containing nanodots.
 5. Thememory cell of claim 4, wherein the metal-containing nanodots compriseat least one metal-containing material selected from the groupconsisting of elemental metals, metal alloys, metal nitrides and metalsilicides.
 6. The memory cell of claim 5, wherein metals of theelemental metals, metal alloys, metal nitrides and metal silicides ofthe at least one metal-containing material are selected from the groupconsisting of titanium, tantalum, tungsten, ruthenium, rhodium, andplatinum.
 7. The memory cell of claim 1, wherein the charge storagematerial comprises a silicon-containing material.
 8. The memory cell ofclaim 7, wherein the silicon-containing material is selected from thegroup consisting of monocrystalline silicon, amorphous silicon andpolycrystalline silicon, and wherein the silicon-containing material iseither undoped or conductively doped.
 9. The memory cell of claim 7,further comprising a barrier between the charge storage material and theconductive nanodots, wherein the barrier comprises a dielectric materialselected from the group consisting of an oxide, a nitride and anoxynitride.
 10. A memory cell, comprising: a tunnel dielectric over asemiconductor; a silicon-containing charge storage material over thetunnel dielectric; a nitridized barrier over the silicon-containingcharge storage material; metal-containing nanodots over the nitridizedbarrier; an intergate dielectric over the metal-containing nanodots; acontrol gate over the intergate dielectric; and source/drain regions inthe semiconductor generally adjacent the tunnel dielectric.
 11. Thememory cell of claim 10, wherein the silicon-containing charge storagematerial comprises polysilicon.
 12. The memory cell of claim 11, whereinthe polysilicon is conductively doped.
 13. The memory cell of claim 10,wherein the metal-containing nanodots comprise at least one metalselected from the group consisting of titanium, tantalum, tungsten,ruthenium, rhodium, and platinum.
 14. The memory cell of claim 10,wherein the nitridized barrier comprises a silicon oxynitride.
 15. Thememory cell of claim 10, wherein the silicon-containing charge storagematerial comprises polysilicon conductively doped to a p-typeconductivity, wherein the nitridized barrier comprises a siliconoxynitride and wherein the metal-containing nanodots comprise elementalruthenium.
 16. The memory cell of claim 15, wherein the metal-containingnanodots further comprise ruthenium silicide.
 17. A memory device,comprising: an array of non-volatile memory cells; and circuitryconfigured to control and/or access the array of non-volatile memorycells; wherein at least one of the non-volatile memory cells comprises acharge storage node which comprises a charge storage material andconductive nanodots; and wherein the conductive nanodots of the chargestorage node are between the charge storage material and a control gateof the at least one of the non-volatile memory cells.
 18. A memorydevice, comprising: an array of non-volatile memory cells; and circuitryconfigured to control and/or access the array of non-volatile memorycells; wherein at least one of the non-volatile memory cells comprises acharge storage node which comprises a charge storage material andconductive nanodots; wherein the conductive nanodots of the chargestorage node are between the charge storage material and a control gateof the at least one of the non-volatile memory cells; wherein the chargestorage node further comprises a barrier between the charge storagematerial and the conductive nanodots; wherein the charge storagematerial is a silicon-containing material selected from the groupconsisting of undoped or conductively doped monocrystalline silicon,undoped or conductively doped amorphous silicon and undoped orconductively doped polycrystalline silicon; wherein the barrier is asilicon-containing dielectric material selected from the groupconsisting of a silicon oxide, a silicon nitride and a siliconoxynitride; wherein the conductive nanodots comprise metal-containingnanodots comprising at least one metal-containing material selected fromthe group consisting of elemental metals, metal alloys, metal nitridesand metal silicides; and wherein metals of the elemental metals, metalalloys, metal nitrides and metal silicides of the at least onemetal-containing material are selected from the group consisting oftitanium, tantalum, tungsten, ruthenium, rhodium, and platinum.
 19. Amemory device, comprising: an array of non-volatile memory cells; andcircuitry configured to control and/or access the array of non-volatilememory cells; wherein at least one of the memory cells comprises a gatestack having a tunnel dielectric over a semiconductor channel, a chargestorage node over the tunnel dielectric, an intergate dielectric overthe charge storage node and a control gate over the intergatedielectric, and wherein the charge storage node comprises asilicon-containing charge storage material, metal-containing nanodotsand a silicon-containing barrier between the silicon-containing chargestorage material and the metal-containing nanodots.
 20. The memorydevice of claim 19, wherein the silicon-containing charge storagematerial comprises a conductively-doped polycrystalline silicon, whereinthe silicon-containing dielectric barrier comprises a silicon oxynitrideand wherein the metal-containing nanodots comprise ruthenium.